HelioVolt will extend its Cooperative Research and Development Agreement with the National Renewable Energy Laboratory. HelioVolt’s continued research will include development of non-vacuum nanomaterial-based deposition processes for its proprietary FASST ™ manufacturing technology. FASST ™ is fastest and most efficient way to manufacture thin-film Copper Indium Gallium Selenide photovoltaics and the process can be used under vacuum or atmospheric conditions to print photovoltaic material directly onto construction materials such as glass, steel, roofing and polymers in 80 to 98 percent less time than conventional processes.
Source : Solar Energy Investing
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